Low temperature MOCVD of Ta<sub>2</sub>O<sub>5</sub> dielectric thin films from Ta[NC(CH<sub>3</sub>)<sub>3</sub>][OC(CH<sub>3</sub>)<sub>3</sub>]<sub>3</sub> and O<sub>2</sub>

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ژورنال

عنوان ژورنال: Journal of the Ceramic Society of Japan

سال: 2016

ISSN: 1348-6535,1882-0743

DOI: 10.2109/jcersj2.15245